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  • Vol. 21, Iss. 24 — Dec. 15, 1996
  • pp: 1960–1962

193-nm excimer-laser-induced densification of fused silica

Douglas C. Allan, Charlene Smith, N. F. Borrelli, and T. P. Seward, III  »View Author Affiliations


Optics Letters, Vol. 21, Issue 24, pp. 1960-1962 (1996)
http://dx.doi.org/10.1364/OL.21.001960


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Abstract

We report the densification of fused silica as a function of exposure to pulsed 193-nm excimer-laser irradiation. Defining a dose as the number of pulses N times the square of fluence I per pulse, we find that densification follows a universal function of dose, a × (NI2)b, where a and b can vary somewhat according to glass preparation. Densification is measured with interferometry and birefringence, interpreted with a finite-element elastic model. Wave-front distortion for a typical photolithographic lens element in typical use conditions is described.

© 1996 Optical Society of America

History
Original Manuscript: July 29, 1996
Published: December 15, 1996

Citation
Douglas C. Allan, Charlene Smith, N. F. Borrelli, and T. P. Seward, "193-nm excimer-laser-induced densification of fused silica," Opt. Lett. 21, 1960-1962 (1996)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-21-24-1960


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References

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