193-nm excimer-laser-induced densification of fused silica
Optics Letters, Vol. 21, Issue 24, pp. 1960-1962 (1996)
http://dx.doi.org/10.1364/OL.21.001960
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Abstract
We report the densification of fused silica as a function of exposure to pulsed 193-nm excimer-laser irradiation. Defining a dose as the number of pulses N times the square of fluence I per pulse, we find that densification follows a universal function of dose, a × (NI2)b, where a and b can vary somewhat according to glass preparation. Densification is measured with interferometry and birefringence, interpreted with a finiteelement elastic model. Wave-front distortion for a typical photolithographic lens element in typical use conditions is described.
© 1996 Optical Society of America
Citation
Douglas C. Allan, Charlene Smith, N. F. Borrelli, and T. P. Seward III, "193-nm excimer-laser-induced densification of fused silica," Opt. Lett. 21, 1960-1962 (1996)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-21-24-1960
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