We report the densification of fused silica as a function of exposure to pulsed 193-nm excimer-laser irradiation. Defining a dose as the number of pulses N times the square of fluence I per pulse, we find that densification follows a universal function of dose, a × (NI2)b, where a and b can vary somewhat according to glass preparation. Densification is measured with interferometry and birefringence, interpreted with a finite-element elastic model. Wave-front distortion for a typical photolithographic lens element in typical use conditions is described.
© 1996 Optical Society of America
Original Manuscript: July 29, 1996
Published: December 15, 1996
Douglas C. Allan, Charlene Smith, N. F. Borrelli, and T. P. Seward, "193-nm excimer-laser-induced densification of fused silica," Opt. Lett. 21, 1960-1962 (1996)