Abstract

Two-photon excitation of carriers in boron E′-center-containing borosilicate glasses results in a photoencoding of selectively etchable regions. Using a turbulent etching process followed by polishing, we have demonstrated a number of patterning capabilities for microtechnology applications such as ultrafast capillary electrophoresis chips and rapid prototyping of diffractive optical elements.

© 1996 Optical Society of America

Multiphoton micrometer-scale photoetching in silicate-based glasses

E. Sauvain, Jae H. Kyung, and N. M. Lawandy
Opt. Lett. 20(3) 243-245 (1995)

Direct observation of the effective χ⁽²⁾ grating in bulk glasses encoded for second-harmonic generation

Jae H. Kyung and N. M. Lawandy
Opt. Lett. 21(9) 632-634 (1996)

Interferometric study of poled glass under etching

W. Margulis and F. Laurell
Opt. Lett. 21(21) 1786-1788 (1996)

Direct measurement of photoinduced charge distribution responsible for second-harmonic generation in glasses

Jae H. Kyung and N. M. Lawandy
Opt. Lett. 21(3) 186-188 (1996)

Laser-assisted etching of borosilicate glass in potassium hydroxide

David Bischof, Michael Kahl, and Markus Michler
Opt. Mater. Express 11(4) 1185-1195 (2021)