Maskless photoencoded selective etching for glass-based microtechnology applications
Optics Letters, Vol. 21, Issue 3, pp. 174-176 (1996)
http://dx.doi.org/10.1364/OL.21.000174
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Abstract
Two-photon excitation of carriers in boron E′-center-containing borosilicate glasses results in a photoencoding of selectively etchable regions. Using a turbulent etching process followed by polishing, we have demonstrated a number of patterning capabilities for microtechnology applications such as ultrafast capillary electrophoresis chips and rapid prototyping of diffractive optical elements.
© 1996 Optical Society of America
Citation
Jae H. Kyung and N. M. Lawandy, "Maskless photoencoded selective etching for glass-based microtechnology applications," Opt. Lett. 21, 174-176 (1996)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-21-3-174
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