Two-photon excitation of carriers in boron E′-center-containing borosilicate glasses results in a photoencoding of selectively etchable regions. Using a turbulent etching process followed by polishing, we have demonstrated a number of patterning capabilities for microtechnology applications such as ultrafast capillary electrophoresis chips and rapid prototyping of diffractive optical elements.
© 1996 Optical Society of America
Original Manuscript: September 8, 1995
Published: February 1, 1996
Jae H. Kyung and N. M. Lawandy, "Maskless photoencoded selective etching for glass-based microtechnology applications," Opt. Lett. 21, 174-176 (1996)