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Optics Letters

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  • Vol. 22, Iss. 19 — Oct. 1, 1997
  • pp: 1473–1475

Fabrication of multipassband moiré resonators in fibers by the dual-phase-mask exposure method

L. A. Everall, K. Sugden, J. A. R. Williams, I. Bennion, X. Liu, J. S. Aitchison, S. Thoms, and R. M. De La Rue  »View Author Affiliations


Optics Letters, Vol. 22, Issue 19, pp. 1473-1475 (1997)
http://dx.doi.org/10.1364/OL.22.001473


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Abstract

We report on the fabrication of in-fiber moiré filters by dual exposure of a nondedicated chirped phase mask. This simple technique produces broadband filters whose structure depends only on an intermediate stretch between two identical UV exposures. We demonstrate moiré filters with as many as four narrow passbands within a 2-nm stopband.

© 1997 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(120.2440) Instrumentation, measurement, and metrology : Filters
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques

Citation
L. A. Everall, K. Sugden, J. A. R. Williams, I. Bennion, X. Liu, J. S. Aitchison, S. Thoms, and R. M. De La Rue, "Fabrication of multipassband moiré resonators in fibers by the dual-phase-mask exposure method," Opt. Lett. 22, 1473-1475 (1997)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-22-19-1473


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