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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 23, Iss. 1 — Jan. 1, 1998
  • pp: 13–15

Microtags with 150-nm line gratings fabricated by use of extreme-ultraviolet lithography

M. R. Descour, D. I. Simon, W. C. Sweatt, M. E. Warren, S. H. Kravitz, K. D. Krenz, A. K. Ray-Chaudhuri, and R. H. Stulen  »View Author Affiliations


Optics Letters, Vol. 23, Issue 1, pp. 13-15 (1998)
http://dx.doi.org/10.1364/OL.23.000013


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Abstract

The microtag concept is an anticounterfeiting and security measure. Microtags are computer-generated holograms (CGH’s) consisting of 150-nm lines arranged to form 300-nm-period gratings. The microtags that we describe were designed for readout at 442nm . The smallest microtag measures 56µm×80 µm when viewed at normal incidence. The CGH design process uses a modified iterative Fourier-transform algorithm to create either phase-only or phase-and-amplitude microtags. We also report on a simple and compact readout system for recording the diffraction pattern formed by a microtag. The measured diffraction patterns agree very well with predictions.

© 1998 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(070.2590) Fourier optics and signal processing : ABCD transforms
(090.1760) Holography : Computer holography
(110.5220) Imaging systems : Photolithography

Citation
M. R. Descour, D. I. Simon, W. C. Sweatt, M. E. Warren, S. H. Kravitz, K. D. Krenz, A. K. Ray-Chaudhuri, and R. H. Stulen, "Microtags with 150-nm line gratings fabricated by use of extreme-ultraviolet lithography," Opt. Lett. 23, 13-15 (1998)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-23-1-13

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