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Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition

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Abstract

A spatial walk-off polarizing film with a large split angle was fabricated by use of the oblique deposition method. The film is composed of slanted needlelike microcolumns of aSi that are separated by resultant fine voids. The polarization-splitting characteristics of the film were clearly observed. The maximum split angle at a wavelength of 1.55 µm was as large as 20°, more than three times greater than those of existing polarizers such as those constructed of rutile and calcite.

© 1998 Optical Society of America

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