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  • Vol. 23, Iss. 20 — Oct. 15, 1998
  • pp: 1609–1611

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

M. A. Klosner and W. T. Silfvast  »View Author Affiliations


Optics Letters, Vol. 23, Issue 20, pp. 1609-1611 (1998)
http://dx.doi.org/10.1364/OL.23.001609


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Abstract

We have observed intense extreme-ultraviolet emission, within the 10–16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5 nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3 nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography.

© 1998 Optical Society of America

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme

Citation
M. A. Klosner and W. T. Silfvast, "Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region," Opt. Lett. 23, 1609-1611 (1998)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-23-20-1609


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