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Optics Letters

Optics Letters

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  • Vol. 23, Iss. 22 — Nov. 15, 1998
  • pp: 1745–1747

Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures

George Witzgall, Rutger Vrijen, Eli Yablonovitch, Vinh Doan, and Benjamin J. Schwartz  »View Author Affiliations


Optics Letters, Vol. 23, Issue 22, pp. 1745-1747 (1998)
http://dx.doi.org/10.1364/OL.23.001745


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Abstract

We report the use of an amplified femtosecond laser for single-shot two-photon exposure of the commercial photoresist SU-8. By scanning of the focal volume through the interior of the resist, three-dimensional (3-D) structures are fabricated on a shot-by-shot basis. The 800-nm two-photon exposure and damage thresholds are 3.2 and 8.1TW/cm2, respectively. The nonlinear nature of the two-photon process allows the production of features that are smaller than the diffraction limit. Preliminary results suggest that Ti:sapphire oscillators can achieve single-shot two-photon exposure with thresholds as low as 1.6TW/cm2 at 700 nm, allowing 3-D structures to be constructed at megahertz repetition rates.

© 1998 Optical Society of America

OCIS Codes
(190.4180) Nonlinear optics : Multiphoton processes
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication

Citation
George Witzgall, Rutger Vrijen, Eli Yablonovitch, Vinh Doan, and Benjamin J. Schwartz, "Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures," Opt. Lett. 23, 1745-1747 (1998)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-23-22-1745


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References

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