Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications
Optics Letters, Vol. 24, Issue 1, pp. 58-60 (1999)
http://dx.doi.org/10.1364/OL.24.000058
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Abstract
We report the initial results of a large-scale evaluation of production-grade fused silica and calcium fluoride to be used in 193-nm lithographic applications. The samples have been provided by many different suppliers of materials. A marathon irradiation chamber permits simultaneous exposure of as many as 36 samples at 800 Hz, at fluences from 0.2 to ≥4 (mJ/cm2)/pulse and pulse counts in excess of 109 . The initial absorption and the laser-induced absorption are found to vary over a wide range. The compaction of each fused-silica sample follows a power law, but its parameters can differ widely from sample to sample.
© 1999 Optical Society of America
[Optical Society of America ]
OCIS Codes
(110.5220) Imaging systems : Photolithography
(140.2180) Lasers and laser optics : Excimer lasers
(160.2750) Materials : Glass and other amorphous materials
Citation
V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates*, and C. Van Peski*, "Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications," Opt. Lett. 24, 58-60 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-1-58
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