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Optics Letters

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  • Vol. 24, Iss. 1 — Jan. 1, 1999
  • pp: 58–60

Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates, and C. Van Peski  »View Author Affiliations


Optics Letters, Vol. 24, Issue 1, pp. 58-60 (1999)
http://dx.doi.org/10.1364/OL.24.000058


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Abstract

We report the initial results of a large-scale evaluation of production-grade fused silica and calcium fluoride to be used in 193-nm lithographic applications. The samples have been provided by many different suppliers of materials. A marathon irradiation chamber permits simultaneous exposure of as many as 36 samples at 800 Hz, at fluences from 0.2 to ≥4 (mJ/cm<sup>2</sup>)/pulse and pulse counts in excess of 10<sup>9</sup> . The initial absorption and the laser-induced absorption are found to vary over a wide range. The compaction of each fused-silica sample follows a power law, but its parameters can differ widely from sample to sample.

© 1999 Optical Society of America

OCIS Codes
(110.5220) Imaging systems : Photolithography
(140.2180) Lasers and laser optics : Excimer lasers
(160.2750) Materials : Glass and other amorphous materials

Citation
V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates, and C. Van Peski, "Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications," Opt. Lett. 24, 58-60 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-1-58


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References

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