OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 24, Iss. 1 — Jan. 1, 1999
  • pp: 58–60

Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates*, and C. Van Peski*  »View Author Affiliations


Optics Letters, Vol. 24, Issue 1, pp. 58-60 (1999)
http://dx.doi.org/10.1364/OL.24.000058


View Full Text Article

Acrobat PDF (292 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

We report the initial results of a large-scale evaluation of production-grade fused silica and calcium fluoride to be used in 193-nm lithographic applications. The samples have been provided by many different suppliers of materials. A marathon irradiation chamber permits simultaneous exposure of as many as 36 samples at 800 Hz, at fluences from 0.2 to ≥4 (mJ/cm2)/pulse and pulse counts in excess of 109 . The initial absorption and the laser-induced absorption are found to vary over a wide range. The compaction of each fused-silica sample follows a power law, but its parameters can differ widely from sample to sample.

© 1999 Optical Society of America

OCIS Codes
(110.5220) Imaging systems : Photolithography
(140.2180) Lasers and laser optics : Excimer lasers
(160.2750) Materials : Glass and other amorphous materials

Citation
V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates*, and C. Van Peski*, "Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications," Opt. Lett. 24, 58-60 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-1-58

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited