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Optics Letters

Optics Letters


  • Vol. 24, Iss. 20 — Oct. 15, 1999
  • pp: 1404–1406

Crystallization of GeO2-SiO2 glass by poling with ArF-laser excitation

Syuji Matsumoto, Takumi Fujiwara, Motoshi Ohama, and Akira J. Ikushima  »View Author Affiliations

Optics Letters, Vol. 24, Issue 20, pp. 1404-1406 (1999)

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We report on crystallization of 15.7GeO2 ˙ 84.3SiO2 (in mol.%) glass by poling with ArF-laser excitation. The UV intensity was 100(mJ/cm 2)/pulse , and the number of shots was 104 . The crystallites that were observed in the glass were approximately 15–20µm in diameter. The crystallization feature was dependent on the poling electric field, showing a threshold field of ~0.5×105V/cm , beyond which crystallization occurred.

© 1999 Optical Society of America

OCIS Codes
(060.4510) Fiber optics and optical communications : Optical communications
(160.2750) Materials : Glass and other amorphous materials
(160.4330) Materials : Nonlinear optical materials

Syuji Matsumoto, Takumi Fujiwara, Motoshi Ohama, and Akira J. Ikushima, "Crystallization of GeO2-SiO2 glass by poling with ArF-laser excitation," Opt. Lett. 24, 1404-1406 (1999)

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