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Optics Letters

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  • Vol. 24, Iss. 20 — Oct. 15, 1999
  • pp: 1422–1424

Broadband antireflection gratings fabricated upon silicon substrates

Y. Kanamori, M. Sasaki, and K. Hane  »View Author Affiliations


Optics Letters, Vol. 24, Issue 20, pp. 1422-1424 (1999)
http://dx.doi.org/10.1364/OL.24.001422


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Abstract

We fabricated a two-dimensional subwavelength structured (SWS) surface upon a crystal silicon substrate. The SWS surface was patterned by electron beam lithography and etched by an SF6 fast atom beam. The SWS grating had a conical profile, the period was 150 nm, and the groove was approximately 350 nm deep. The reflectivity was examined at 2002500-nm wavelengths. At 400 nm the reflectivity decreased to 0.5% from the 54.7% of the silicon substrate. We also used HeNe laser light to examine the reflectivity as a function of the incident angle.

© 1999 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(220.4610) Optical design and fabrication : Optical fabrication
(310.1210) Thin films : Antireflection coatings

Citation
Y. Kanamori, M. Sasaki, and K. Hane, "Broadband antireflection gratings fabricated upon silicon substrates," Opt. Lett. 24, 1422-1424 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-20-1422


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