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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 24, Iss. 23 — Dec. 1, 1999
  • pp: 1702–1704

Measurement of trench depth by infrared interferometry

T. van Kessel and H. K. Wickramasinghe  »View Author Affiliations


Optics Letters, Vol. 24, Issue 23, pp. 1702-1704 (1999)
http://dx.doi.org/10.1364/OL.24.001702


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Abstract

Measurement and control of high-aspect-ratio structures such as dynamic random-access memory trenches is an important step in the manufacture of modern memory devices. We present a novel technique based on infrared interferometry that has been implemented in manufacturing and is capable of measuring sub- 0.25-μm -wide and 10-μm -deep trenches nondestructively and with an accuracy of better than 0.1μm .

© 1999 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing

Citation
T. van Kessel and H. K. Wickramasinghe, "Measurement of trench depth by infrared interferometry," Opt. Lett. 24, 1702-1704 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-23-1702


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References

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