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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 24, Iss. 8 — Apr. 15, 1999
  • pp: 516–518

Arresting ultraviolet-laser damage in fused silica

F. Dahmani, S. J. Burns, J. C. Lambropoulos, S. Papernov, and A. W. Schmid  »View Author Affiliations


Optics Letters, Vol. 24, Issue 8, pp. 516-518 (1999)
http://dx.doi.org/10.1364/OL.24.000516


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Abstract

The 351-nm laser-damage initiation threshold for surface damage in conventionally polished fused silica is demonstrated to be stress dependent. By circumferential application of modest loads to a sample, a controllable stress field can be established within the clear aperture of a fused-silica specimen, in response to which both the damage-initiation fluence and the crack-propagation fluence requirements are increased above those for unstressed conditions.

© 1999 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.3380) Lasers and laser optics : Laser materials
(140.3390) Lasers and laser optics : Laser materials processing
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(160.4670) Materials : Optical materials
(160.6030) Materials : Silica

Citation
F. Dahmani, S. J. Burns, J. C. Lambropoulos, S. Papernov, and A. W. Schmid, "Arresting ultraviolet-laser damage in fused silica," Opt. Lett. 24, 516-518 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-8-516

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