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Optics Letters

Optics Letters

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  • Vol. 25, Iss. 9 — May. 1, 2000
  • pp: 640–642

Nanoscale nonlinear optical process: theoretical modeling of second-harmonic generation for both forbidden and allowed light

Yan Jiang, D. Jakubczyk, Yuzhen Shen, J. Swiatkiewicz, and P. N. Prasad  »View Author Affiliations


Optics Letters, Vol. 25, Issue 9, pp. 640-642 (2000)
http://dx.doi.org/10.1364/OL.25.000640


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Abstract

Based on a combination of the multiple-multipole method and nonlinear coupled-wave equations, a rigorous three-dimensional numerical simulation of nonlinear optical interactions between an optical near field and a nonlinear medium is performed, allowing us to study the dependence of second-harmonic (SH) near-field intensity on tip–sample distance and the polarization state of the incident fundamental wave. It is demonstrated that allowed and forbidden light make different contributions to the SH near-field intensity.

© 2000 Optical Society of America

OCIS Codes
(180.5810) Microscopy : Scanning microscopy
(190.4160) Nonlinear optics : Multiharmonic generation
(190.7110) Nonlinear optics : Ultrafast nonlinear optics

Citation
Yan Jiang, D. Jakubczyk, Yuzhen Shen, J. Swiatkiewicz, and P. N. Prasad, "Nanoscale nonlinear optical process: theoretical modeling of second-harmonic generation for both forbidden and allowed light," Opt. Lett. 25, 640-642 (2000)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-25-9-640

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