We have fabricated photorefractive InGaAs/GaAs multiple quantum wells that are sensitive at wavelengths near 1.06 μm for what is believed to be the first time. We have measured four-wave-mixing diffraction efficiency, using a Nd:YAG laser. A maximum diffraction efficiency of 7 × 10-4 and a cutoff grating period of ∼2 μm are obtained.
© 2001 Optical Society of America
[Optical Society of America ]
S. Iwamoto, S. Taketomi, H. Kageshima, M. Nishioka, T. Someya, Y. Arakawa, K. Fukutani, T. Shimura, and K. Kuroda, "Photorefractive multiple quantum wells at 1064 nm," Opt. Lett. 26, 22-24 (2001)