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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 26, Iss. 11 — Jun. 1, 2001
  • pp: 792–794

Multilayer mirror for x rays below 190 eV

C. Michaelsen, J. Wiesmann, R. Bormann, C. Nowak, C. Dieker, S. Hollensteiner, and W. Jäger  »View Author Affiliations


Optics Letters, Vol. 26, Issue 11, pp. 792-794 (2001)
http://dx.doi.org/10.1364/OL.26.000792


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Abstract

La/B4C multilayers have been fabricated by magnetron sputtering for use as x-ray mirrors at energies below 190 eV, particularly for detection of boron K and α x rays at 183 eV, their performance has been compared with that of Mo/B4C multilayers, which are currently the best-performing multilayers for this energy range. Transmission electron microscopy and synchrotron soft-x-ray reflectometry were used to study the structural quality of the multilayers and their performance as x-ray mirrors. The results show a significant improvement of the peak reflectivity and the spectral purity, indicating that La/B4C has a high potential to replace Mo/B4C in many x-ray optical applications below 190 eV.

© 2001 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(230.1480) Optical devices : Bragg reflectors
(230.4170) Optical devices : Multilayers
(340.0340) X-ray optics : X-ray optics
(340.6720) X-ray optics : Synchrotron radiation
(340.7470) X-ray optics : X-ray mirrors

Citation
C. Michaelsen, J. Wiesmann, R. Bormann, C. Nowak, C. Dieker, S. Hollensteiner, and W. Jäger, "Multilayer mirror for x rays below 190 eV," Opt. Lett. 26, 792-794 (2001)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-26-11-792

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