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Optics Letters

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  • Vol. 26, Iss. 15 — Aug. 1, 2001
  • pp: 1182–1184

Imaging of 1-nm-thick films with 193-nm microscopy

M. Switkes, M. Rothschild, and M. Salvermoser  »View Author Affiliations


Optics Letters, Vol. 26, Issue 15, pp. 1182-1184 (2001)
http://dx.doi.org/10.1364/OL.26.001182


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Abstract

We have implemented a reflected-light microscope operating in the deep ultraviolet at 193 nm. Many materials absorb strongly at this wavelength, providing greatly enhanced contrast compared with visible and near-ultraviolet microscopes. Polymer films as thin as 1 nm and SiO2 films as thin as 3 nm have been imaged with this nonoptimized instrument. We have also calculated image contrast for several thin-film materials that are important in semiconductor processing, and we show that 193-nm light provides 60–485× better contrast than visible light (500 nm) and 4–95× better contrast than near-ultraviolet light (315 nm) for these materials.

© 2001 Optical Society of America

OCIS Codes
(110.0180) Imaging systems : Microscopy
(180.0180) Microscopy : Microscopy
(310.3840) Thin films : Materials and process characterization

Citation
M. Switkes, M. Rothschild, and M. Salvermoser, "Imaging of 1-nm-thick films with 193-nm microscopy," Opt. Lett. 26, 1182-1184 (2001)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-26-15-1182


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References

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