Antireflection microstructures fabricated upon fluorine-doped SiO2 films
Optics Letters, Vol. 26, Issue 21, pp. 1642-1644 (2001)
http://dx.doi.org/10.1364/OL.26.001642
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Abstract
Two-dimensional periodic structures were fabricated upon a fluorine-doped SiO2 film in which the fluorine content changed gradually in the direction of film thickness. The films were deposited by plasma-enhanced chemical-vapor deposition. The film was periodically patterned into a 1-μm period and an ~1-μm -groove depth by inductive coupled plasma reactive-ion etching followed by chemical etching in a diluted HF solution. A surface reflectance of 0.7% was attained at 1.85-μm wavelength, a value that is one fifth as large as the 3.5% Fresnel reflection of a SiO2 substrate with a flat surface.
© 2001 Optical Society of America
[Optical Society of America ]
OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(160.6030) Materials : Silica
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.4000) Optical devices : Microstructure fabrication
(310.1210) Thin films : Antireflection coatings
Citation
K. Kintaka, J. Nishii, A. Mizutani, H. Kikuta, and H. Nakano, "Antireflection microstructures fabricated upon fluorine-doped SiO2 films," Opt. Lett. 26, 1642-1644 (2001)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-26-21-1642
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