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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 27, Iss. 1 — Jan. 1, 2002
  • pp: 46–48

157-nm coherent light source as an inspection tool for F2 laser lithography

T. Suganuma, H. Kubo, O. Wakabayashi, H. Mizoguchi, K. Nakao, Y. Nabekawa, T. Togashi, and S. Watanabe  »View Author Affiliations


Optics Letters, Vol. 27, Issue 1, pp. 46-48 (2002)
http://dx.doi.org/10.1364/OL.27.000046


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Abstract

We have developed a 157-nm coherent light source by two-photon resonant four-wave mixing in Xe, with two tunable single-mode 1-kHz Ti:sapphire laser systems at 768 and 681 nm. This light source has been developed to determine the instrumental function of a vacuum ultraviolet spectrometer and to evaluate optical designs for ultra-line-narrowed F2 laser lithography. The spectral linewidth of the source was less than 0.008 pm (FWHM), with an average power of 0.6 mW.

© 2002 Optical Society of America

OCIS Codes
(140.3280) Lasers and laser optics : Laser amplifiers
(140.3570) Lasers and laser optics : Lasers, single-mode
(140.3600) Lasers and laser optics : Lasers, tunable
(140.3610) Lasers and laser optics : Lasers, ultraviolet
(190.2620) Nonlinear optics : Harmonic generation and mixing
(190.4380) Nonlinear optics : Nonlinear optics, four-wave mixing

Citation
T. Suganuma, H. Kubo, O. Wakabayashi, H. Mizoguchi, K. Nakao, Y. Nabekawa, T. Togashi, and S. Watanabe, "157-nm coherent light source as an inspection tool for F2 laser lithography," Opt. Lett. 27, 46-48 (2002)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-27-1-46

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