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Temperature sensitivity of Ge–B–SiO2 waveguide Bragg gratings on a crystallized glass substrate

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Abstract

Waveguide Bragg gratings were fabricated by plasma-enhanced chemical-vapor deposition followed by irradiation with KrF excimer laser light through a phase mask. The period of the Bragg grating was 0.53 µm, and the Bragg wavelength was 1.53 µm. The temperature dependence of the Bragg wavelength was 11 pm/°C for a 10GeO290SiO2 mol.% core waveguide on a Si substrate, and the Bragg wavelength shift was successfully reduced to 5.0 pm/°C by use of a 14GeO212B2O374SiO2 mol.% core and a crystallized glass substrate with a thermal-expansion coefficient of -2.0×10-6 /°C.

© 2002 Optical Society of America

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