A novel real-time gray-scale photolithography technique for the fabrication of continuous microstructures that uses a LCD panel as a real-time gray-scale mask is presented. The principle of design of the technique is explained, and computer simulation results based on partially coherent imaging theory are given for the patterning of a microlens array and a zigzag grating. An experiment is set up, and a microlens array and a zigzag grating on panchromatic silver halide sensitized gelatin with trypsinase etching are obtained.
© 2002 Optical Society of America
Qinjun Peng, Yongkang Guo, Shijie Liu, and Zheng Cui, "Real-time gray-scale photolithography for fabrication of continuous microstructure," Opt. Lett. 27, 1720-1722 (2002)