Real-time gray-scale photolithography for fabrication of continuous microstructure
Optics Letters, Vol. 27, Issue 19, pp. 1720-1722 (2002)
http://dx.doi.org/10.1364/OL.27.001720
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Abstract
A novel real-time gray-scale photolithography technique for the fabrication of continuous microstructures that uses a LCD panel as a real-time gray-scale mask is presented. The principle of design of the technique is explained, and computer simulation results based on partially coherent imaging theory are given for the patterning of a microlens array and a zigzag grating. An experiment is set up, and a microlens array and a zigzag grating on panchromatic silver halide sensitized gelatin with trypsinase etching are obtained.
© 2002 Optical Society of America
[Optical Society of America ]
OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.3720) Optical devices : Liquid-crystal devices
Citation
Qinjun Peng, Yongkang Guo, Shijie Liu, and Zheng Cui, "Real-time gray-scale photolithography for fabrication of continuous microstructure," Opt. Lett. 27, 1720-1722 (2002)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-27-19-1720
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