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Optics Letters

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  • Vol. 27, Iss. 20 — Oct. 15, 2002
  • pp: 1773–1775

Noninterferometric wide-field optical profilometry with nanometer depth resolution

Chau-Hwang Lee, Hong-Yao Mong, and Wan-Chen Lin  »View Author Affiliations


Optics Letters, Vol. 27, Issue 20, pp. 1773-1775 (2002)
http://dx.doi.org/10.1364/OL.27.001773


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Abstract

Applying the principle of differential confocal microscopy to wide-field optically sectioning microscopy, we develop a noninterferometric optical profilometer without scanning mechanisms. Depth resolution of 2 nm is achieved with a power-regulated tungsten-halogen lamp as the light source and a 14-bit CCD camera as the detector. The effects of inhomogeneous surface reflectivity are removed from topographic measurements by arithmetic division. The whole system can be constructed on a single silicon chip for use as a miniaturized optical profiler.

© 2002 Optical Society of America

OCIS Codes
(100.3010) Image processing : Image reconstruction techniques
(120.2830) Instrumentation, measurement, and metrology : Height measurements
(180.6900) Microscopy : Three-dimensional microscopy

Citation
Chau-Hwang Lee, Hong-Yao Mong, and Wan-Chen Lin, "Noninterferometric wide-field optical profilometry with nanometer depth resolution," Opt. Lett. 27, 1773-1775 (2002)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-27-20-1773


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References

  1. For example, the Wyko NT2000 Optical Profiler, produced by the Veeco Metrology Group (Tucson, Ariz.).
  2. L. Deck and P. de Groot, Appl. Opt. 33, 7334 (1994).
  3. C.-H. Lee and J. Wang, Opt. Commun. 135, 233 (1997).
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