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Optics Letters

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  • Vol. 27, Iss. 24 — Dec. 15, 2002
  • pp: 2170–2172

Generation and focusing of submilliwatt-average-power 50-nm pulses by the fifth harmonic of a KrF laser

D. Yoshitomi, T. Shimizu, T. Sekikawa, and S. Watanabe  »View Author Affiliations


Optics Letters, Vol. 27, Issue 24, pp. 2170-2172 (2002)
http://dx.doi.org/10.1364/OL.27.002170


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Abstract

We demonstrate generation and focusing of 49.7-nm pulses with an average power of 0.1 mW at 200 Hz and with a pulse energy of >1 µJ at 10 Hz by the fifth harmonic of a femtosecond KrF laser. The fifth harmonic is selected and focused with a concave Sc/Si multilayer mirror to a diameter of 2µm, resulting in a peak intensity of 0.5 TW/cm2, which will make extreme-ultraviolet nonlinear optics feasible. A novel single-shot linear in situ method of spot-size measurement by use of self-trapped exciton luminescence is also demonstrated.

© 2002 Optical Society of America

OCIS Codes
(160.2540) Materials : Fluorescent and luminescent materials
(190.0190) Nonlinear optics : Nonlinear optics
(190.4160) Nonlinear optics : Multiharmonic generation
(190.4180) Nonlinear optics : Multiphoton processes
(190.7110) Nonlinear optics : Ultrafast nonlinear optics
(300.6280) Spectroscopy : Spectroscopy, fluorescence and luminescence

Citation
D. Yoshitomi, T. Shimizu, T. Sekikawa, and S. Watanabe, "Generation and focusing of submilliwatt-average-power 50-nm pulses by the fifth harmonic of a KrF laser," Opt. Lett. 27, 2170-2172 (2002)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-27-24-2170


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