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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 27, Iss. 9 — May. 1, 2002
  • pp: 728–730

Reflection characteristics of a copper metal-organic chemical-vapor-deposited thin film for vertical micromirror applications

Jong Hyun Lee, Ho Nam Kwon, Jae Hyun Sone, and Jay Moon  »View Author Affiliations


Optics Letters, Vol. 27, Issue 9, pp. 728-730 (2002)
http://dx.doi.org/10.1364/OL.27.000728


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Abstract

We introduce Cu metal-organic chemical-vapor deposition as a potential means of conformal metal coating of the sidewalls of micromachined vertical mirrors. The optimal process temperature was experimentally found to be 215 °C, which gives high step coverage of better than 90%, and the surface roughness was less than 27 nm. The roughness, measured with an atomic force microscope, will induce a scattering loss less than 0.12 dB, which is small enough for vertical micromirror application. The experimental reflectances of Cu thin film were measured with a distributed-feedback laser (1550 nm) and found to be greater than 0.9 for incidence angles of 22.5° and 45°, and these reflectances were in good agreement with theoretical values.

© 2002 Optical Society of America

OCIS Codes
(160.4760) Materials : Optical properties
(310.3840) Thin films : Materials and process characterization

Citation
Jong Hyun Lee, Ho Nam Kwon, Jae Hyun Sone, and Jay Moon, "Reflection characteristics of a copper metal-organic chemical-vapor-deposited thin film for vertical micromirror applications," Opt. Lett. 27, 728-730 (2002)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-27-9-728


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References

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