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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 27, Iss. 9 — May. 1, 2002
  • pp: 746–748

Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals

A. Feigel, Z. Kotler, and B. Sfez  »View Author Affiliations


Optics Letters, Vol. 27, Issue 9, pp. 746-748 (2002)
http://dx.doi.org/10.1364/OL.27.000746


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Abstract

Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.

© 2002 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication

Citation
A. Feigel, Z. Kotler, and B. Sfez, "Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals," Opt. Lett. 27, 746-748 (2002)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-27-9-746


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