Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.
© 2002 Optical Society of America
A. Feigel, Z. Kotler, and B. Sfez, "Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals," Opt. Lett. 27, 746-748 (2002)