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Optics Letters

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  • Vol. 28, Iss. 11 — Jun. 1, 2003
  • pp: 869–871

Vertical adiabatic transition between a silica planar waveguide and an electro-optic polymer fabricated with gray-scalelithography

Daniel H. Chang, Talal Azfar, Seong-Ku Kim, Harold R. Fetterman, Cheng Zhang, and WilliamH. Steier  »View Author Affiliations


Optics Letters, Vol. 28, Issue 11, pp. 869-871 (2003)
http://dx.doi.org/10.1364/OL.28.000869


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Abstract

We report on a vertical adiabatic transition between silica planar waveguides and electro-optic (EO) polymer. Gray-scale lithography was used to pattern a polymer transition with an exponential profile. Excess losses of the order of 1 dB were measured, and good mode matching to simulation was observed. This configuration, which married the advantages of both silica and EO-polymer planar-optic technologies, demonstrates a new technique for fabricating hybrid active devices with high modulation speed, low insertion loss, and complex geometries.

© 2003 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(160.2100) Materials : Electro-optical materials
(160.5470) Materials : Polymers
(160.6030) Materials : Silica
(220.3740) Optical design and fabrication : Lithography

Citation
Daniel H. Chang, Talal Azfar, Seong-Ku Kim, Harold R. Fetterman, Cheng Zhang, and WilliamH. Steier, "Vertical adiabatic transition between a silica planar waveguide and an electro-optic polymer fabricated with gray-scalelithography," Opt. Lett. 28, 869-871 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-11-869


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