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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 28, Iss. 11 — Jun. 1, 2003
  • pp: 932–934

Current-controlled curvature of coated micromirrors

Wei Liu and Joseph J. Talghader  »View Author Affiliations


Optics Letters, Vol. 28, Issue 11, pp. 932-934 (2003)
http://dx.doi.org/10.1364/OL.28.000932


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Abstract

Precise control of micromirror curvature is critical in many optical microsystems. Micromirrors with current-controlled curvature are demonstrated. The working principle is that resistive heating changes the temperature of the micromirrors and thermal expansion induces a controlled curvature whose magnitude is determined by coating design. For example, for wide focal-length tuning, the radius of curvature of a gold-coated mirror was tuned from 2.5 to 8.2 mm over a current-induced temperature range from 22° to 72 °C. For fine focal-length tuning, the radius of curvature of a dielectric-coated (SiO2 /Y2O3λ/4pairs) mirror was tuned from -0.68 to -0.64mm over a current-induced temperature range from 22 to 84 °C. These results should be readily extendable to mirror flattening or real-time adaptive shape control.

© 2003 Optical Society of America

OCIS Codes
(220.2560) Optical design and fabrication : Propagating methods
(310.0310) Thin films : Thin films

Citation
Wei Liu and Joseph J. Talghader, "Current-controlled curvature of coated micromirrors," Opt. Lett. 28, 932-934 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-11-932


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References

  1. J. T. Nee, R. A. Conant, M. R. Hart, R. S. Muller, and K. Y. Lau, in Proceedings of the IEEE Thirteenth Annual International Conference on MEMS (Institute for Electrical and Electronics Engineers, Piscataway, N.J., 2000), pp. 704-709.
  2. W. D. Cowan, M. K. Lee, B. M. Welsh, V. M. Bright, and M. C. Roggemann, IEEE J. Sel. Top. Quantum Electron. 5, 90 (1999).
  3. T. G. Bifano, R. Krishnamoorthy, J. K. Dorton, J. Perreault, N. Vandelli, N. M. Horenstein, and D. A. Castanon, Opt. Eng. 36, 1354 (1997).
  4. G. Vdovin, S. Middelhoek, and P. M. Sarro, Opt. Eng. 36, 1382 (1997).
  5. L. Y. Lin, E. L. Goldstein, and R. W. Tkach, IEEE Photon. Technol. Lett. 10, 525 (1998).
  6. W. Liu and J. J. Talghader, Appl. Opt. 41, 3285 (2000).
  7. M. Vasudevan and W. Johnson, Appl. Sci. Res. Sect. B 9, 420 (1962).
  8. A. J. Chapman, Heat Transfer, 4th ed. (Macmillan, New York, 1984).
  9. J. H. Apfel, Appl. Opt. 20, 1024 (1981).

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