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Optics Letters

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  • Vol. 28, Iss. 14 — Jul. 15, 2003
  • pp: 1260–1262

Silicon-based transmissive diffractive optical element

Chien Chieh Lee, Yu Cheng Chang, Chih Ming Wang, Jenq Yang Chang, and Gou Chung Chi  »View Author Affiliations


Optics Letters, Vol. 28, Issue 14, pp. 1260-1262 (2003)
http://dx.doi.org/10.1364/OL.28.001260


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Abstract

A silicon nitride (SiNx) membrane diffractive optical element (DOE) designed to exhibit beam-splitting and focusing behavior at visible wavelengths has been fabricated and tested. Since the fabrication process is based on silicon micromachining technology, the DOE is easily integrated with a laser diode chip and a photodiode chip on a silicon substrate to function as the hologram-laser-photodiode unit for use in the pickup head of a CD or DVD system. The SiNx film is deposited with low-pressure chemical-vapor deposition and the free-standing membrane is formed by KOH etching. The transmissive DOE showed a high diffraction efficiency (>20% for a binary-phase-level element). The experimental evaluation was in good agreement with the designed and modeled predictions.

© 2003 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(210.4770) Optical data storage : Optical recording
(220.0220) Optical design and fabrication : Optical design and fabrication

Citation
Chien Chieh Lee, Yu Cheng Chang, Chih Ming Wang, Jenq Yang Chang, and Gou Chung Chi, "Silicon-based transmissive diffractive optical element," Opt. Lett. 28, 1260-1262 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-14-1260


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