Silicon-based transmissive diffractive optical element
Optics Letters, Vol. 28, Issue 14, pp. 1260-1262 (2003)
http://dx.doi.org/10.1364/OL.28.001260
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Abstract
A silicon nitride (SiNx) membrane diffractive optical element (DOE) designed to exhibit beam-splitting and focusing behavior at visible wavelengths has been fabricated and tested. Since the fabrication process is based on silicon micromachining technology, the DOE is easily integrated with a laser diode chip and a photodiode chip on a silicon substrate to function as the hologram-laser-photodiode unit for use in the pickup head of a CD or DVD system. The SiNx film is deposited with low-pressure chemical-vapor deposition and the free-standing membrane is formed by KOH etching. The transmissive DOE showed a high diffraction efficiency (>20% for a binary-phase-level element). The experimental evaluation was in good agreement with the designed and modeled predictions.
© 2003 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(210.4770) Optical data storage : Optical recording
(220.0220) Optical design and fabrication : Optical design and fabrication
Citation
Chien Chieh Lee, Yu Cheng Chang, Chih Ming Wang, Jenq Yang Chang, and Gou Chung Chi, "Silicon-based transmissive diffractive optical element," Opt. Lett. 28, 1260-1262 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-14-1260
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