Grating-enhanced through-wafer optical microprobe for mic roelectromechanical system high-resolution optical position feedback
Optics Letters, Vol. 28, Issue 14, pp. 1263-1265 (2003)
http://dx.doi.org/10.1364/OL.28.001263
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Abstract
We present modeling and experimental results from the use of a 1310-nm-wavelength through-wafer optical microprobe in conjunction with a microstructure grating to monitor the motion of a lateral comb resonator stage. The optical signal that results from shuttle interaction with the microprobe beam exhibits a peak-to-valley dynamic range that corresponds to 2-µm microstructure displacement, facilitating submicrometer positional resolution on digitization. This signal was used to achieve microstructure positional feedback and effective microsystem model parameter extraction, which are essential for structure control and model-based fault detection.
© 2003 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3940) Instrumentation, measurement, and metrology : Metrology
(130.0130) Integrated optics : Integrated optics
Citation
J. M. Dawson, L. Wang, P. Famouri, and L. A. Hornak, "Grating-enhanced through-wafer optical microprobe for mic roelectromechanical system high-resolution optical position feedback," Opt. Lett. 28, 1263-1265 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-14-1263
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