Femtosecond holographic interferometry for studies of semiconductor ablation using vanadium dioxide film
Optics Letters, Vol. 28, Issue 16, pp. 1463-1465 (2003)
http://dx.doi.org/10.1364/OL.28.001463
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Abstract
A recording medium based on the phenomenon of phase transition from semiconductor to metal is applied to holography in the femtosecond time domain. The results of holographic interferometry studies of semiconductor ablation are presented.
© 2003 Optical Society of America
OCIS Codes
(090.2880) Holography : Holographic interferometry
(090.2900) Holography : Optical storage materials
(320.7100) Ultrafast optics : Ultrafast measurements
Citation
A. A. Bugayev and M. C. Gupta, "Femtosecond holographic interferometry for studies of semiconductor ablation using vanadium dioxide film," Opt. Lett. 28, 1463-1465 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-16-1463
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