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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 28, Iss. 17 — Sep. 1, 2003
  • pp: 1534–1536

Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy

Pascal Mercère, Philippe Zeitoun, Mourad Idir, Sébastien Le Pape, Denis Douillet, Xavier Levecq, Guillaume Dovillaire, Samuel Bucourt, Kenneth A. Goldberg, Patrick P. Naulleau, and Senajith Rekawa  »View Author Affiliations


Optics Letters, Vol. 28, Issue 17, pp. 1534-1536 (2003)
http://dx.doi.org/10.1364/OL.28.001534


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Abstract

We report, for the first time to our knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range. The reference wave front needed to calibrate the sensor was generated by spatially filtering a focused undulator beam with 1.7- and 0.6-μm -diameter pinholes. To fully characterize the sensor, accuracy and sensitivity measurements were performed. The incident beam’s wavelength was varied from 7 to 25 nm. Measurements of accuracy better than λEUV/120 (0.11 nm) were obtained at λEUV=13.4 nm . The aberrations introduced by an additional thin mirror, as well as wave front of the spatially unfiltered incident beam, were also measured.

© 2003 Optical Society of America

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme

Citation
Pascal Mercère, Philippe Zeitoun, Mourad Idir, Sébastien Le Pape, Denis Douillet, Xavier Levecq, Guillaume Dovillaire, Samuel Bucourt, Kenneth A. Goldberg, Patrick P. Naulleau, and Senajith Rekawa, "Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy," Opt. Lett. 28, 1534-1536 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-17-1534

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