Although bright x-ray sources exist at shorter wavelengths, the development of sophisticated diagnostics with x-ray laser sources has been restricted to wavelengths longer than 12.5 nm because of the limitations of the widely used Mo:Si multilayer mirrors. With the novel Mo:Y multilayer mirrors that we present, many x-ray laser applications can be extended to the 7–12-nm range. We demonstrate this new capability by imaging the near-field output of the Ni-like Sn laser at 11.9 nm.
© 2003 Optical Society of America
Joseph Nilsen, Saša Bajt, Henry N. Chapman, Felix Staub, and Jürg Balmer, "Mo:Y multilayer mirror technology utilized to image the near-field output of a Ni-like Sn laser at 11.9nm," Opt. Lett. 28, 2249-2251 (2003)