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Optics Letters

Optics Letters


  • Vol. 28, Iss. 22 — Nov. 15, 2003
  • pp: 2249–2251

Mo:Y multilayer mirror technology utilized to image the near-field output of a Ni-like Sn laser at 11.9nm

Joseph Nilsen, Saša Bajt, Henry N. Chapman, Felix Staub, and Jürg Balmer  »View Author Affiliations

Optics Letters, Vol. 28, Issue 22, pp. 2249-2251 (2003)

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Although bright x-ray sources exist at shorter wavelengths, the development of sophisticated diagnostics with x-ray laser sources has been restricted to wavelengths longer than 12.5 nm because of the limitations of the widely used Mo:Si multilayer mirrors. With the novel Mo:Y multilayer mirrors that we present, many x-ray laser applications can be extended to the 7–12-nm range. We demonstrate this new capability by imaging the near-field output of the Ni-like Sn laser at 11.9 nm.

© 2003 Optical Society of America

OCIS Codes
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(340.0340) X-ray optics : X-ray optics
(340.7470) X-ray optics : X-ray mirrors

Joseph Nilsen, Saša Bajt, Henry N. Chapman, Felix Staub, and Jürg Balmer, "Mo:Y multilayer mirror technology utilized to image the near-field output of a Ni-like Sn laser at 11.9nm," Opt. Lett. 28, 2249-2251 (2003)

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