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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 28, Iss. 7 — Apr. 1, 2003
  • pp: 564–566

Stress-induced birefringence control in optical planar waveguides

Xiuli Zhao, Chunfei Li, and Y. Z. Xu  »View Author Affiliations


Optics Letters, Vol. 28, Issue 7, pp. 564-566 (2003)
http://dx.doi.org/10.1364/OL.28.000564


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Abstract

For what is to our knowledge the first time, the thermal-stress formula in analytical form is derived for the core layer in an optical planar waveguide by the thin-film approximation, which is based on a closed-form solution in multilayered isotropic structures off the edges. This formula indicates that elastic, thermal, and structural parameters can affect the magnitude of the stress. Using the formula, one can remove thermal stress and hence stress-induced birefringence by proper waveguide design.

© 2003 Optical Society of America

OCIS Codes
(160.6030) Materials : Silica
(230.4170) Optical devices : Multilayers
(230.7390) Optical devices : Waveguides, planar
(260.1440) Physical optics : Birefringence
(310.6870) Thin films : Thin films, other properties

Citation
Xiuli Zhao, Chunfei Li, and Y. Z. Xu, "Stress-induced birefringence control in optical planar waveguides," Opt. Lett. 28, 564-566 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-7-564


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