Abstract
Classic dense wavelength-division multiplexing thin-film filters can be spectrally tuned through the substrate’s strain. We analyze the theoretical shift of the design wavelength of a narrow-bandpass filter when uniform, uniaxial compressive stress is applied to the substrate, and we compare calculated sensitivity with experimental data. We measure the transmittance shape of a 200-GHz standard filter for several loading cases to quantify the increase of insertion losses.
© 2003 Optical Society of America
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Rémy Parmentier and Michel Lequime, "Substrate-strain-induced tunability of dense wavelength-division multiplexing thin- film filters: erratum," Opt. Lett. 28, 1279-1279 (2003)https://opg.optica.org/ol/abstract.cfm?uri=ol-28-14-1279
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