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  • Vol. 29, Iss. 11 — Jun. 1, 2004
  • pp: 1209–1211

Guiding and confining light in void nanostructure

Vilson R. Almeida, Qianfan Xu, Carlos A. Barrios, and Michal Lipson  »View Author Affiliations


Optics Letters, Vol. 29, Issue 11, pp. 1209-1211 (2004)
http://dx.doi.org/10.1364/OL.29.001209


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Abstract

We present a novel waveguide geometry for enhancing and confining light in a nanometer-wide low-index material. Light enhancement and confinement is caused by large discontinuity of the electric field at high-index-contrast interfaces. We show that by use of such a structure the field can be confined in a 50-nm-wide low-index region with a normalized intensity of 20µm <sup>-2</sup> . This intensity is approximately 20 times higher than what can be achieved in SiO<sub>2</sub> with conventional rectangular waveguides.

© 2004 Optical Society of America

OCIS Codes
(030.4070) Coherence and statistical optics : Modes
(130.0130) Integrated optics : Integrated optics
(130.2790) Integrated optics : Guided waves
(230.7370) Optical devices : Waveguides
(230.7380) Optical devices : Waveguides, channeled
(230.7390) Optical devices : Waveguides, planar
(230.7400) Optical devices : Waveguides, slab

Citation
Vilson R. Almeida, Qianfan Xu, Carlos A. Barrios, and Michal Lipson, "Guiding and confining light in void nanostructure," Opt. Lett. 29, 1209-1211 (2004)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-29-11-1209


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