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Optics Letters

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  • Vol. 29, Iss. 12 — Jun. 15, 2004
  • pp: 1312–1314

Stress in femtosecond-laser-written waveguides in fused silica

V. R. Bhardwaj, P. B. Corkum, D. M. Rayner, C. Hnatovsky, E. Simova, and R. S. Taylor  »View Author Affiliations


Optics Letters, Vol. 29, Issue 12, pp. 1312-1314 (2004)
http://dx.doi.org/10.1364/OL.29.001312


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Abstract

We identify two states of stress induced in waveguides fabricated by femtosecond lasers in fused silica and show how they can be relieved by annealing. In-plane stress and stress concentration are revealed through birefringence and loss measurements. Another kind of laser-induced stress appears in the form of swelling of the glass surface when waveguides are written near the surface and is a manifestation of confined rapid material quenching. By annealing the sample we reduce the losses by ~30% (at 633 nm) and decrease the birefringence by a factor of 4 in fused silica.

© 2004 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.3440) Lasers and laser optics : Laser-induced breakdown
(320.7110) Ultrafast optics : Ultrafast nonlinear optics

Citation
V. R. Bhardwaj, P. B. Corkum, D. M. Rayner, C. Hnatovsky, E. Simova, and R. S. Taylor, "Stress in femtosecond-laser-written waveguides in fused silica," Opt. Lett. 29, 1312-1314 (2004)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-29-12-1312


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