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  • Vol. 29, Iss. 24 — Dec. 15, 2004
  • pp: 2870–2872

Employing oxygen-plasma posttreatment to improve the laser-induced damage threshold of ZrO2 films prepared by the electron-beam evaporation method

Dongping Zhang, Jianda Shao, Dawei Zhang, Shuhai Fan, Tianya Tan, and Zhengxiu Fan  »View Author Affiliations


Optics Letters, Vol. 29, Issue 24, pp. 2870-2872 (2004)
http://dx.doi.org/10.1364/OL.29.002870


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Abstract

ZrO2 films are deposited by the electron-beam evaporation method. Parts of the prepared samples are posttreated with oxygen plasma at the environment temperature. The laser-induced damage threshold (LIDT) of the films increases from 15.9 to 23.1 J/cm2 after treatment with oxygen plasma. Compared with that of the as-grown samples, significant reduction of the average microdefect density and absorption are found after oxygen-plasma posttreatment. These results indicate that the oxygen-plasma posttreatment technique is an effective and simple method for reducing the microdefect density and absorption to improve the LIDT.

© 2004 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.0310) Thin films : Thin films
(310.3840) Thin films : Materials and process characterization

Citation
Dongping Zhang, Jianda Shao, Dawei Zhang, Shuhai Fan, Tianya Tan, and Zhengxiu Fan, "Employing oxygen-plasma posttreatment to improve the laser-induced damage threshold of ZrO2 films prepared by the electron-beam evaporation method," Opt. Lett. 29, 2870-2872 (2004)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-29-24-2870


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