ZrO<sub>2</sub> films are deposited by the electron-beam evaporation method. Parts of the prepared samples are posttreated with oxygen plasma at the environment temperature. The laser-induced damage threshold (LIDT) of the films increases from 15.9 to 23.1 J/cm<sup>2</sup> after treatment with oxygen plasma. Compared with that of the as-grown samples, significant reduction of the average microdefect density and absorption are found after oxygen-plasma posttreatment. These results indicate that the oxygen-plasma posttreatment technique is an effective and simple method for reducing the microdefect density and absorption to improve the LIDT.
© 2004 Optical Society of America
Dongping Zhang, Jianda Shao, Dawei Zhang, Shuhai Fan, Tianya Tan, and Zhengxiu Fan, "Employing oxygen-plasma posttreatment to improve the laser-induced damage threshold of ZrO2 films prepared by the electron-beam evaporation method," Opt. Lett. 29, 2870-2872 (2004)