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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 30, Iss. 11 — Jun. 1, 2005
  • pp: 1300–1302

Nonplanar photolithography with computer-generated holograms

A. Maiden, R. McWilliam, A. Purvis, S. Johnson, G. L. Williams, N. L. Seed, and P. A. Ivey  »View Author Affiliations


Optics Letters, Vol. 30, Issue 11, pp. 1300-1302 (2005)
http://dx.doi.org/10.1364/OL.30.001300


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Abstract

We outline a method for accomplishing photolithography on grossly nonplanar substrates. First we compute an approximation of the diffraction pattern that will produce the desired light-intensity distribution on the substrate to be patterned. This pattern is then digitized and converted into a format suitable for manufacture by a direct-write method. The resultant computer-generated hologram mask is then used in a custom alignment tool to expose the photoresist-coated substrate. The technique has many potential applications in the packaging of microelectronics and microelectromechanical systems.

© 2005 Optical Society of America

OCIS Codes
(090.1760) Holography : Computer holography
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography

Citation
A. Maiden, R. McWilliam, A. Purvis, S. Johnson, G. L. Williams, N. L. Seed, and P. A. Ivey, "Nonplanar photolithography with computer-generated holograms," Opt. Lett. 30, 1300-1302 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-11-1300

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