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Optics Letters

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  • Vol. 30, Iss. 14 — Jul. 15, 2005
  • pp: 1867–1869

Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica

C. Hnatovsky, R. S. Taylor, E. Simova, V. R. Bhardwaj, D. M. Rayner, and P. B. Corkum  »View Author Affiliations


Optics Letters, Vol. 30, Issue 14, pp. 1867-1869 (2005)
http://dx.doi.org/10.1364/OL.30.001867


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Abstract

We fabricate microchannels in fused silica by femtosecond laser irradiation followed by etching in diluted hydrofluoric acid. We show a dramatic dependence of the etch rate on the laser polarization, spanning 2 orders of magnitude. We establish the existence of an energy-per-pulse threshold at which etching of the laser-modified zones becomes highly polarization selective. The enhanced selective etching is due to long-range, periodic, polarization-dependent nanostructures formed in the laser-modified material.

© 2005 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(230.3990) Optical devices : Micro-optical devices
(230.4000) Optical devices : Microstructure fabrication

Citation
C. Hnatovsky, R. S. Taylor, E. Simova, V. R. Bhardwaj, D. M. Rayner, and P. B. Corkum, "Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica," Opt. Lett. 30, 1867-1869 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-14-1867


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