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Optics Letters

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  • Vol. 30, Iss. 16 — Aug. 15, 2005
  • pp: 2119–2121

Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods

Shuying Shao, Jianda Shao, Hongbo He, and Zhengxiu Fan  »View Author Affiliations


Optics Letters, Vol. 30, Issue 16, pp. 2119-2121 (2005)
http://dx.doi.org/10.1364/OL.30.002119


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Abstract

The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the ZrO2/SiO2 multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress.

© 2005 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(310.3840) Thin films : Materials and process characterization

Citation
Shuying Shao, Jianda Shao, Hongbo He, and Zhengxiu Fan, "Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods," Opt. Lett. 30, 2119-2121 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-16-2119


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