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Optics Letters

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  • Vol. 30, Iss. 17 — Sep. 1, 2005
  • pp: 2251–2253

Trimming of microring resonators by photo-oxidation of a plasma-polymerized organosilane cladding material

Daniel K. Sparacin, Ching-yin Hong, Lionel C. Kimerling, Jurgen Michel, John P. Lock, and Karen K. Gleason  »View Author Affiliations


Optics Letters, Vol. 30, Issue 17, pp. 2251-2253 (2005)
http://dx.doi.org/10.1364/OL.30.002251


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Abstract

As the complexity of microphotonic devices grows, the ability to precisely trim microring resonators becomes increasingly important. Photo-oxidation trimming uses UV irradiation to oxidize a cladding layer composed of polymerized hexamethyldisilane (6M2S) deposited with plasma-enhanced chemical vapor deposition (PECVD). PECVD 6M2S has optical properties that are compatible with microring devices, and its high cross linking renders it insoluble. Photo-oxidation decreases the refractive index of PECVD 6M2S by nearly 4%, permitting large resonance shifts that are not feasible with thermal trimming techniques. Resonance shifts from single-mode, 100 µm diameter Si3N4(n=2.2) rings were as large as 12.8 nm for the TE mode and 23.5 nm for the TM mode.

© 2005 Optical Society of America

OCIS Codes
(230.7380) Optical devices : Waveguides, channeled

Citation
Daniel K. Sparacin, Ching-yin Hong, Lionel C. Kimerling, Jurgen Michel, John P. Lock, and Karen K. Gleason, "Trimming of microring resonators by photo-oxidation of a plasma-polymerized organosilane cladding material," Opt. Lett. 30, 2251-2253 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-17-2251


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