Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask
Optics Letters, Vol. 30, Issue 2, pp. 150-152 (2005)
http://dx.doi.org/10.1364/OL.30.000150
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Abstract
The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with pi phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated. The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated.
© 2005 Optical Society of America
OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(110.5220) Imaging systems : Photolithography
(350.3950) Other areas of optics : Micro-optics
Citation
Jinwon Sung, Heidi Hockel, and Eric G. Johnson, "Analog micro-optics fabrication by use of a two-dimensional binary
phase-grating mask," Opt. Lett. 30, 150-152 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-2-150
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