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Optics Letters

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  • Vol. 30, Iss. 2 — Jan. 15, 2005
  • pp: 150–152

Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask

Jinwon Sung, Heidi Hockel, and Eric G. Johnson  »View Author Affiliations


Optics Letters, Vol. 30, Issue 2, pp. 150-152 (2005)
http://dx.doi.org/10.1364/OL.30.000150


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Abstract

The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with pi phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated. The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated.

© 2005 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(110.5220) Imaging systems : Photolithography
(350.3950) Other areas of optics : Micro-optics

Citation
Jinwon Sung, Heidi Hockel, and Eric G. Johnson, "Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask," Opt. Lett. 30, 150-152 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-2-150


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References

  1. A. K.-K. Wong, Resolution Enhancement Techniques in Optical Lithography, Vol. TT47 of SPIE Tutorial Texts (SPIE, Bellingham, Wash., 2001) Chap.3.
  2. W. Henke, W. Hoppe, H. J. Quenzer, P. Staudt-Fischbach, and B. Wagner, in Proceedings of Micro Electro Mechanical Systems 1994, (Institute of Electrical and Electronics Engineers, Piscataway, N.J., 1994), pp. 205-210.
  3. M. Pitchumani, H. Hockel, W. Mohammed, and E. G. Johnson, Appl. Opt. 41, 10 (2002).
  4. B. Morgan and C. M. Waits, IEEE J. Microelectromech. Syst. 13, 113 (2004).

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