The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with pi phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated. The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated.
© 2005 Optical Society of America
Jinwon Sung, Heidi Hockel, and Eric G. Johnson, "Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask," Opt. Lett. 30, 150-152 (2005)