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Optics Letters

Optics Letters


  • Editor: Anthony J. Campillo
  • Vol. 30, Iss. 23 — Dec. 1, 2005
  • pp: 3186–3188

Terbium-based extreme ultraviolet multilayers

David L. Windt, John F. Seely, Benjawan Kjornrattanawanich, and Yu. A. Uspenskii  »View Author Affiliations

Optics Letters, Vol. 30, Issue 23, pp. 3186-3188 (2005)

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We have fabricated periodic multilayers that comprise either Si Tb or SiC Tb bilayers, designed to operate as narrowband reflective coatings near 60 nm wavelength in the extreme ultraviolet (EUV). We find peak reflectance values in excess of 20% near normal incidence. The spectral bandpass of the best Si Tb multilayer was measured to be 6.5 nm full width at half-maximum (FWHM), while SiC Tb multilayers have a more broad response, of order 9.4 nm FWHM. Transmission electron microscopy analysis of Si Tb multilayers reveals polycrystalline Tb layers, amorphous Si layers, and relatively large asymmetric amorphous interlayers. Thermal annealing experiments indicate excellent stability to 100°C (1 h) for Si Tb . These new multilayer coatings have the potential for use in normal incidence instrumentation in a region of the EUV where efficient narrowband multilayers have not been available until now. In particular, reflective Si Tb multilayers can be used for solar physics applications where the coatings can be tuned to important emission lines such as O V near 63.0 nm and Mg X near 61.0 nm.

© 2005 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties
(340.0340) X-ray optics : X-ray optics
(350.1260) Other areas of optics : Astronomical optics

ToC Category:
Optical Devices

David L. Windt, John F. Seely, Benjawan Kjornrattanawanich, and Yu. A. Uspenskii, "Terbium-based extreme ultraviolet multilayers," Opt. Lett. 30, 3186-3188 (2005)

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