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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 1 — Jan. 1, 2006
  • pp: 68–70

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

A. Ritucci, G. Tomassetti, A. Reale, L. Arrizza, P. Zuppella, L. Reale, L. Palladino, F. Flora, F. Bonfigli, A. Faenov, T. Pikuz, J. Kaiser, J. Nilsen, and A. F. Jankowski  »View Author Affiliations


Optics Letters, Vol. 31, Issue 1, pp. 68-70 (2006)
http://dx.doi.org/10.1364/OL.31.000068


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Abstract

We applied a 0.3 mJ, 1.7 ns, 46.9 nm soft-x-ray argon laser to ablate the surface of large bandgap dielectrics: Ca F 2 and LiF crystals. We studied the ablation versus the fluence of the soft-x-ray beam, varying the fluence in the range 0.05 3 J cm 2 . Ablation thresholds of 0.06 and 0.1 J cm 2 and ablation depths of 14 and 20 nm were found for Ca F 2 and LiF, respectively. These results define new ablation conditions for these large bandgap dielectrics that can be of interest for the fine processing of these materials.

© 2006 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(160.4670) Materials : Optical materials

ToC Category:
Lasers and Laser Optics

Citation
A. Ritucci, G. Tomassetti, A. Reale, L. Arrizza, P. Zuppella, L. Reale, L. Palladino, F. Flora, F. Bonfigli, A. Faenov, T. Pikuz, J. Kaiser, J. Nilsen, and A. F. Jankowski, "Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam," Opt. Lett. 31, 68-70 (2006)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-31-1-68

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