OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 10 — May. 15, 2006
  • pp: 1367–1369

Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist

Biow Hiem Ong, Xiaocong Yuan, Shaohua Tao, and Swee Chuan Tjin  »View Author Affiliations


Optics Letters, Vol. 31, Issue 10, pp. 1367-1369 (2006)
http://dx.doi.org/10.1364/OL.31.001367


View Full Text Article

Enhanced HTML    Acrobat PDF (247 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

We present a new lithographic technique based on a hybrid photothermal process to modulate the refractive index in commercial SU-8 photoresist. Owing to a difference in cross-linking, the refractive index of unexposed SU-8 cross-linked by thermally induced polymerization is 0.0072 higher than that of SU-8 cross-linked by UV exposure and postbaking. Making use of this property, we fabricated two thick, flat-topped index-modulated diffractive optical elements (DOEs) that contain different phase distributions and measured their wavefront reconstruction. The good experimental reconstructions of the index DOEs demonstrate the potential to extend the refractive-index modulation technique for the fabrication of three-dimensional optical elements without needing a development step.

© 2006 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(160.4670) Materials : Optical materials
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Diffraction and Gratings

History
Original Manuscript: November 21, 2005
Revised Manuscript: February 6, 2006
Manuscript Accepted: March 1, 2006

Citation
Biow Hiem Ong, Xiaocong Yuan, Shaohua Tao, and Swee Chuan Tjin, "Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist," Opt. Lett. 31, 1367-1369 (2006)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-31-10-1367


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. C. Darraud, B. Bennamane, C. Gagnadre, J. L. Decossas, J. C. Vareille, and J. Stejny, Appl. Opt. 33, 3338 (1994). [CrossRef] [PubMed]
  2. O. M. Efimov, L. B. Glebov, and V. I. Smirnov, Opt. Lett. 25, 1693 (2000). [CrossRef]
  3. R. Feng and R. J. Farris, J. Micromech. Microeng. 13, 80 (2003). [CrossRef]
  4. R. Hardman, MicroChem Corporation, 1254 Chestnut Street, Newton, Massachusetts 02464 (personal communication, 2005).
  5. A. L. Bogdanov and S. S. Peredkov, Microelectron. Eng. 53, 493 (2000). [CrossRef]
  6. A. Cusano, G. Breglio, M. Giordano, A. Calabrò, A. Cutolo, and L. Nicolais, J. Opt. A, Pure Appl. Opt. 3, 126 (2001). [CrossRef]
  7. J. de Boer, R. J. Visser, and G. P. Melis, Polymer 33, 1123 (1992). [CrossRef]
  8. S. H. Tao and X.-C. Yuan, Appl. Opt. 43, 2089 (2004). [CrossRef] [PubMed]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

Figures

Fig. 1 Fig. 2 Fig. 3
 

Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited