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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 10 — May. 15, 2006
  • pp: 1367–1369

Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist

Biow Hiem Ong, Xiaocong Yuan, Shaohua Tao, and Swee Chuan Tjin  »View Author Affiliations


Optics Letters, Vol. 31, Issue 10, pp. 1367-1369 (2006)
http://dx.doi.org/10.1364/OL.31.001367


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Abstract

We present a new lithographic technique based on a hybrid photothermal process to modulate the refractive index in commercial SU-8 photoresist. Owing to a difference in cross-linking, the refractive index of unexposed SU-8 cross-linked by thermally induced polymerization is 0.0072 higher than that of SU-8 cross-linked by UV exposure and postbaking. Making use of this property, we fabricated two thick, flat-topped index-modulated diffractive optical elements (DOEs) that contain different phase distributions and measured their wavefront reconstruction. The good experimental reconstructions of the index DOEs demonstrate the potential to extend the refractive-index modulation technique for the fabrication of three-dimensional optical elements without needing a development step.

© 2006 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(160.4670) Materials : Optical materials
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Diffraction and Gratings

History
Original Manuscript: November 21, 2005
Revised Manuscript: February 6, 2006
Manuscript Accepted: March 1, 2006

Citation
Biow Hiem Ong, Xiaocong Yuan, Shaohua Tao, and Swee Chuan Tjin, "Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist," Opt. Lett. 31, 1367-1369 (2006)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-31-10-1367

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