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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 17 — Sep. 1, 2006
  • pp: 2613–2615

Large-area surface-plasmon polariton interference lithography

Xiaowei Guo, Jinglei Du, Yongkang Guo, and Jun Yao  »View Author Affiliations


Optics Letters, Vol. 31, Issue 17, pp. 2613-2615 (2006)
http://dx.doi.org/10.1364/OL.31.002613


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Abstract

Large-area surface-plasmon polariton (SPP) interference lithography is presented, which uses an attenuated total reflection-coupling mode to excite the interference of the SPPs. The interference of the SPPs causes a highly directional intensity range in a finite depth of the electric field, which is good for noncontact. Finite-difference time-domain simulations of the interference on a thin resist layer show that broad-beam illumination with a p-polarized light at a wavelength of 441 nm can produce features as small as 60 nm with high contrast, smaller than λ 7 . Our results illustrate the potential for patterning periodic structures over large areas at low cost.

© 2006 Optical Society of America

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(240.6690) Optics at surfaces : Surface waves
(260.3160) Physical optics : Interference
(260.3910) Physical optics : Metal optics

ToC Category:
Optics at Surfaces

History
Original Manuscript: April 27, 2006
Revised Manuscript: June 20, 2006
Manuscript Accepted: June 21, 2006
Published: August 9, 2006

Citation
Xiaowei Guo, Jinglei Du, Yongkang Guo, and Jun Yao, "Large-area surface-plasmon polariton interference lithography," Opt. Lett. 31, 2613-2615 (2006)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-31-17-2613


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