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Optics Letters

Optics Letters


  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 17 — Sep. 1, 2006
  • pp: 2613–2615

Large-area surface-plasmon polariton interference lithography

Xiaowei Guo, Jinglei Du, Yongkang Guo, and Jun Yao  »View Author Affiliations

Optics Letters, Vol. 31, Issue 17, pp. 2613-2615 (2006)

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Large-area surface-plasmon polariton (SPP) interference lithography is presented, which uses an attenuated total reflection-coupling mode to excite the interference of the SPPs. The interference of the SPPs causes a highly directional intensity range in a finite depth of the electric field, which is good for noncontact. Finite-difference time-domain simulations of the interference on a thin resist layer show that broad-beam illumination with a p-polarized light at a wavelength of 441 nm can produce features as small as 60 nm with high contrast, smaller than λ 7 . Our results illustrate the potential for patterning periodic structures over large areas at low cost.

© 2006 Optical Society of America

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(240.6690) Optics at surfaces : Surface waves
(260.3160) Physical optics : Interference
(260.3910) Physical optics : Metal optics

ToC Category:
Optics at Surfaces

Original Manuscript: April 27, 2006
Revised Manuscript: June 20, 2006
Manuscript Accepted: June 21, 2006
Published: August 9, 2006

Xiaowei Guo, Jinglei Du, Yongkang Guo, and Jun Yao, "Large-area surface-plasmon polariton interference lithography," Opt. Lett. 31, 2613-2615 (2006)

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  1. J. P. Spallas, A. M. Hawryluk, and D. R. Kania, J. Vac. Sci. Technol. B 13, 1973 (1995). [CrossRef]
  2. H. H. Solak and C. David, J. Vac. Sci. Technol. B 21, 2883 (2003). [CrossRef]
  3. M. M. Alkaisi, R. J. Blaikie, and S. J. McNab, Microelectron. Eng. 53, 237 (2000). [CrossRef]
  4. R. J. Blaikie and S. J. McNab, Appl. Opt. 40, 1692 (2001). [CrossRef]
  5. T. W. Ebbesen, H. J. Lezec, H. F. Ghaemi, T. Thio, and P. A. Wolff, Nature 391, 667 (1998). [CrossRef]
  6. X. G. Luo and T. Ishihara, Appl. Phys. Lett. 84, 4780 (2004). [CrossRef]
  7. Z. W. Liu, Q. H. Wei, and X. Zhang, Nano Lett. 5, 957 (2005). [CrossRef] [PubMed]
  8. K. Matsubara, S. Kawata, and S. Minami, Appl. Opt. 27, 1160 (1988). [CrossRef] [PubMed]
  9. H. Raether, Surface Plasmon on Smooth and Rough Surfaces and on Gratings (Springer-Verlag, 1988).
  10. J. P. Berenger, Comput. Phys. 114, 185 (1994). [CrossRef]
  11. Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005). [CrossRef]
  12. J. C. Martinez-Anton, J. Opt. A 8, s213 (2006). [CrossRef]
  13. W. M. Moreau, Semiconductor Lithography: Principles, Practices, and Materials (Plenum, 1998).
  14. X. Caide and S. F. Sui, Sens. Actuators B 66, 174 (2000). [CrossRef]
  15. J. C. Quail, J. G. Rako, and H. J. Simon, Opt. Lett. 8, 377 (1983). [CrossRef] [PubMed]
  16. V. Silin and A. Plant, Trends Biotechnol. 15, 353 (1997). [CrossRef]

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