Integrated optical filter arrays fabricated by using the combinatorial etching technique
Optics Letters, Vol. 31, Issue 3, pp. 332-334 (2006)
http://dx.doi.org/10.1364/OL.31.000332
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Abstract
A combinatorial etching technique is developed to fabricate integrated narrow bandpass filters on a single substrate. It is highly efficient for fabrication of integrated filter arrays in optical regions. A monolithic filter array has been fabricated by using the technique with a two-step deposition process. The filter contains 32 elements in the near-infrared region. The relative full width at half-maximum (FWHM)
© 2006 Optical Society of America
OCIS Codes
(120.2440) Instrumentation, measurement, and metrology : Filters
(230.3120) Optical devices : Integrated optics devices
(230.4170) Optical devices : Multilayers
(330.6110) Vision, color, and visual optics : Spatial filtering
(350.2460) Other areas of optics : Filters, interference
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: August 11, 2005
Revised Manuscript: September 19, 2005
Manuscript Accepted: October 6, 2005
Virtual Issues
Vol. 1, Iss. 3 Virtual Journal for Biomedical Optics
Citation
Shao-Wei Wang, Xiaoshuang Chen, Wei Lu, Li Wang, Yonggang Wu, and Zhanshan Wang, "Integrated optical filter arrays fabricated by using the combinatorial etching technique," Opt. Lett. 31, 332-334 (2006)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-31-3-332
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