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Optics Letters

Optics Letters


  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 3 — Feb. 1, 2006
  • pp: 332–334

Integrated optical filter arrays fabricated by using the combinatorial etching technique

Shao-Wei Wang, Xiaoshuang Chen, Wei Lu, Li Wang, Yonggang Wu, and Zhanshan Wang  »View Author Affiliations

Optics Letters, Vol. 31, Issue 3, pp. 332-334 (2006)

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A combinatorial etching technique is developed to fabricate integrated narrow bandpass filters on a single substrate. It is highly efficient for fabrication of integrated filter arrays in optical regions. A monolithic filter array has been fabricated by using the technique with a two-step deposition process. The filter contains 32 elements in the near-infrared region. The relative full width at half-maximum (FWHM) δ λ λ of the filter elements is less than 0.2%. Such a narrow bandpass filter array can be utilized in many optical applications.

© 2006 Optical Society of America

OCIS Codes
(120.2440) Instrumentation, measurement, and metrology : Filters
(230.3120) Optical devices : Integrated optics devices
(230.4170) Optical devices : Multilayers
(330.6110) Vision, color, and visual optics : Spatial filtering
(350.2460) Other areas of optics : Filters, interference

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: August 11, 2005
Revised Manuscript: September 19, 2005
Manuscript Accepted: October 6, 2005

Virtual Issues
Vol. 1, Iss. 3 Virtual Journal for Biomedical Optics

Shao-Wei Wang, Xiaoshuang Chen, Wei Lu, Li Wang, Yonggang Wu, and Zhanshan Wang, "Integrated optical filter arrays fabricated by using the combinatorial etching technique," Opt. Lett. 31, 332-334 (2006)

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