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Optics Letters

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  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 3 — Feb. 1, 2006
  • pp: 395–397

Low-loss one-dimensional photonic bandgap filter in (110) silicon

Ariel Lipson and Eric M. Yeatman  »View Author Affiliations


Optics Letters, Vol. 31, Issue 3, pp. 395-397 (2006)
http://dx.doi.org/10.1364/OL.31.000395


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Abstract

A free-space silicon one-dimensional photonic bandgap optical filter is designed and fabricated. A two-stage (110) wafer etching process is employed to form the extremely vertical, smooth, and high-aspect-ratio features that are essential for good optical properties. The ⟨111⟩ oriented planes of the wafer form < 0.01 ° off-vertical trenches that make up the Fabry–Perot filter. A simulation model is presented that analyzes the effect of verticality and predicts the measured spectrum well.

© 2006 Optical Society of America

OCIS Codes
(050.2230) Diffraction and gratings : Fabry-Perot
(060.2310) Fiber optics and optical communications : Fiber optics
(060.4510) Fiber optics and optical communications : Optical communications
(120.2230) Instrumentation, measurement, and metrology : Fabry-Perot
(120.2440) Instrumentation, measurement, and metrology : Filters
(230.4000) Optical devices : Microstructure fabrication

ToC Category:
Diffraction and Gratings

History
Original Manuscript: July 13, 2005
Manuscript Accepted: October 11, 2005

Citation
Ariel Lipson and Eric M. Yeatman, "Low-loss one-dimensional photonic bandgap filter in (110) silicon," Opt. Lett. 31, 395-397 (2006)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-31-3-395


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