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Optics Letters

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  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 9 — May. 1, 2006
  • pp: 1316–1318

Development of high-throughput, high-damage-threshold beam separator for 13 nm high-order harmonics

Yutaka Nagata, Yasuo Nabekawa, and Katsumi Midorikawa  »View Author Affiliations


Optics Letters, Vol. 31, Issue 9, pp. 1316-1318 (2006)
http://dx.doi.org/10.1364/OL.31.001316


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Abstract

We demonstrate a high-throughput, high-damage-threshold beam separator for wavelengths shorter than 30 nm , which uses a 10 nm thick niobium nitrogen film prepared on a Si substrate, set at the Brewster angle relative to the pump wavelength. The film was deposited by rf reactive magnetron sputtering on a Si substrate. The beam separator has an attenuation ratio of 0.01 and a damage-threshold intensity of at least 0.8 TW cm 2 for a 26 fs pump pulse. The measured reflectivity of the beam separator exceeded 70% in a wavelength range of 13 18 nm . This broadband beam separator may be used to eliminate energetic laser pulses from longitudinally pumped x ray lasers as well as from high-order harmonics.

© 2006 Optical Society of America

OCIS Codes
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(190.4160) Nonlinear optics : Multiharmonic generation
(230.1360) Optical devices : Beam splitters
(320.0320) Ultrafast optics : Ultrafast optics
(340.0340) X-ray optics : X-ray optics

ToC Category:
Optical Devices

History
Original Manuscript: December 21, 2005
Manuscript Accepted: January 24, 2006

Citation
Yutaka Nagata, Yasuo Nabekawa, and Katsumi Midorikawa, "Development of high-throughput, high-damage-threshold beam separator for13 nm high-order harmonics," Opt. Lett. 31, 1316-1318 (2006)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-31-9-1316


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